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Leti @SPIE Advanced Lithography 2019

Du 26/02/2019 au 28/02/2019
Convention Center San Jose, Californie, USA

Leti @SPIE Advanced Lithography 2019

Cette année, les chercheurs du CEA-Leti présenteront 7 papiers à l'occasion de 'SPIE Advanced Lithography', la conférence la plus sélective consacrée à la lithographie.

En parallèle, le Leti organisera un workshop satellite sur la lithographie en partenariat avec ARKEMA et E-BEAM le jeudi 28 février 2019 à l'hôtel Marriott de San José, en Californie.

 Evénement gratuit sur invitation. Pour plus d'information, contacter Laurent.pain@cea.fr.

 

Les présentations Leti à SPIE Advanced Lithography 2019:

Mardi 26 février 2019    

  • Session 3 - Grayscale lithography process study for sub 5µm microlens patterns
    Horaire : 11h50
  • Session 7 - Application of PSD for the extraction of programmed line roughness from SAXS
    Horaire : 15h40
  • Session 7  - Tilted beam SEM, 3D metrology for industry
    Horaire: 17h

 

Mercredi 27 février 2019   

  • Session 6 - Performance validation of Mapper's FLX-1200
    Horaire : 9h00
  • Session 8 - Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
    Horaire :  11h10
  • Session 4 - 3D Resist Reflow Compact Model for Imager Microlens Shape Optimization
    Horaire : 16h10

 

Jeudi 28 février 2019 

  • Session 12 -   Sub 10nm patterning using DNA origami

       Horaire : 13h30


Infos Pratiques

San Jose Convention Center
San Jose, Californie, USA

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