Time & Place
| Title
| Authors
|
February 28
|
Time: 4:30 PM - 4:50 PM PST
Room: Grand Ballroom 220B
| Can remote SEM contours be used to match various SEM tools in fabs?
| J. Pradelles, L.Perraud, E. Sezestre, Aulrélien Fay, N. G. Schuch, T. Figueiro,F. Robert
|
Time: 4:50 PM - 5:10 PM PST
Room: 211B
| Replication of 3D patterns from a grayscale resin master by nanoimprint process
| A. Warsono, D. S. F. Rodas, J. Rêche, A. De Lehelle D'Affroux, S. Bérard-Bergery
|
March 1 |
Time: 4:00 PM - 4:20 PM PST
Room: 220C
| Chitosan as a water-based photoresist for DUV lithography
| I. Servin, A. Teolis, A. F. Bazin, A. Sarrazin, P. Durin, O. Sysova, B. Saudet, D. Léonard, O. Soppera, J.-L. Leclercq, Y. Chevolot, R. Tiron, T. Delair, S. Trombotto
|
| Time: 5:30 PM - 7:00 PM PST Room: Hall 2
| Hierarchical patterning: sub-10 μm 3D structures nano-textured by block copolymer self-assembly
| R. Feougier, M. Argoud, N. Posseme, R. Tiron
|
| Time: 5:30 PM - 7:00 PM PST Room: Hall 2
| Overlay performances of wafer scale nanoimprint lithography
| J. Rêche, A. Warsono, A. De Lehelle D'Affroux, J. Khan, S. Haumann, A. Kneidinger
|
| Time: 5:30 PM - 7:00 PM PST Room: Hall 2
| E-beam direct write lithography the versatile ally of optical lithography
| F. Laulagnet, J.-A. Dallery, L. Pain, M. May, B. Hemard, F. Garlet, I. Servin, C. Sabbione
|
| Time: 5:30 PM - 7:00 PM PST Room: Hall 2
| Fine improvement of track process defectivity rate targeting minority yield-killing defect classes using a novel defect detection procedure combining high sensitivity optical inspection, guided e-beam inspection and AI technology | J. P. Nacenta Mendivil, M. Harumoto, M. May, R. Tiron, K. Jullian, Y. Tanaka, A. Royer, F. Kouemeni Tchouake, L. Couturier
|
| Time: 5:30 PM - 7:00 PM PST Room: Hall 2
| Die-level nano-topography metrology to characterize the stress-induced in-plane distortion contribution to overlay
| V. Balan, F. Michel, I. Mendes, C. Lapeyre, L. Vignoud, R. Otten, O. Mouraille, L. van Dijk, B. Minghetti, J. Depre, R. J. F. van Haren
|
March 2 |
| Time: 8:50 AM - 9:10 AM PST Room: 220B
| Critical dimension measurement techniques from synchrotron small angle X-ray scattering to industrial optical scatterometry techniques |
T. Choisnet, A. Hammouti, V. Gagneur, J. Reche, G. Rademaker, G. Freychet, G. Jullien, J. Ducote, P. Gergaud, D. Le Cunff |
| Time: 9:10 AM - 9:30 AM PST Room: 220B
| Critical dimension grazing incidence small angle x-ray scattering using a compact Cu-Kα x-ray source
| G. Freychet, Y. Blancquaert, G. J. Rademaker, P. Gergaud |
| Time: 5:30 PM - 7:00 PM PST Room: 211B
| Impact of optical mask variability on 3D grayscale lithography patterning
| S. Bérard-Bergery, G. Bélot, U. Palanchoke, A. Fay, E. Sungauer, C. Beylier, F. Tomaso, R. Coquand
|