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SPIE Advenced Lithography + Patterning

From 2/23/2025 to 2/27/2025
San Jose, California, US

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Discover CEA-Leti's latest results in lithography and patterning


DISCOVER CEA-LETI’S MAJOR SCIENTIFIC RESULTS 

With 9 papers, ​2 are invited papers, the institute will present this year’s major scientific results at SPIE Advenced Lithography + Patterning, including the following topics:

  • Plasma eatching processes for non-volatile memories
  • Sustainabilitiy in microelectronics industry
  • Evaluation of alternative chemistries for lithography (non-fluorinated)
  • Etching mechanisms behing greyscale
  • Metrology and characterization processes

CEA-Leti scientific papers​

25 February 2025
​10:00 AM - 10:30 AM ​
Paper 13429-38
PST | Convention Center,
Room 211B​

Christelle Boixaderas ​

Plasma etching processes challenges for advanced non-volatile memories
​INVITED PAPER

26 February 2025
​9:00 AM - 9:20 AM​
Paper 13428-35
Convention Center,
Room 210C​

Jérôme Rêche ​

Evaluation of a non-fluorinated (Non-PFAS) KrF photoresist used in semi-conductor manufacturing​

25 February 2025
10:30 AM - 10:50 AM​
Paper 13426-14
Convention Center,
Grand Ballroom 220B​

Timothée Choisnet ​

Small angle X-ray scattering industrial overlay metrology solutions for 7 nm nodes and beyond​​

26 February 2025
4:00 PM - 4:30 PM​
Paper 13427-38​
Convention Center,
Room 210A​

Laurent Pain

Patterning and repair of transparent conductive oxide films with capillary printing​​

24 February 2025
3:50 PM - 4:30 PM ​
Paper 13427-9
Convention Center,
Room 210A​

Laurent Pain

The roads toward a sustainable semiconductor industry
INVITED PAPER​​

27 February 2025
8:40 AM - 9:00 AM ​
Paper 13429-27
Convention Center,
Room 211B​

Aurélien Tavernier

Etching mechanisms behind grayscale 3D multi-height structures transfer for optoelectronic devices ​​​

25 February 2025
11:00 AM - 11:30 AM ​
Paper 13429-40
Convention Center,
Room 211B​

Jean-Philippe Michel ​

3D Superconducting interconnections

26 February 2025
5:30 PM - 7:00​ PM
Paper 13426-76​
Convention Center,
Hall 2 ​​

Rita Chidoub

Define a measurement standard to monitor local variabilities baseline of immersion lithography for photonic devices ​​​​

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Thierry Chevolleau will have the honor of chairing Session 9: Computational Patterning, Patterning Process Control and Plasma Process Modeling and Simulation ​​​​ ​​ ​​​

27 February 2025
​10:40 AM - 11:40 AM ​
Convention Center,
Room 211B​

Session Chairs:​Keun Hee Bai, SAMSUNG Electronics Co., Ltd. (Korea, Republic of), Thierry Chevolleau, CEA-LETI (France)





ABOUT THE SPIE ADVENCED LITHOGRAPHY + PATTERNING

The conference for solving challenges in optical and EUV lithography, patterning technologies, metrology ...

DL_Icon.pngMore information on ​​SPIE Advenced Lithography + Patterning​’s website

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Practical information

​Contact :​

Laurent Pain

Sustainable Electronics Program Director​

Nacima Allouti

Industrial Partnerships
Manager for Silicon Technologies division,
CEA-Leti​​​​​​​​​


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C​EA-Leti contacts

Laurent Pain

Sustainable Electronics Program Director​

Nacima Allouti

Industrial Partnerships
Manager for Silicon Technologies division,
CEA-Leti​​​​​​​​

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