EVENT
Discover CEA-Leti's latest results in lithography and patterning
DISCOVER CEA-LETI’S MAJOR SCIENTIFIC RESULTS
With 9 papers, 2 are invited papers, the institute will present this year’s major scientific results at SPIE Advenced Lithography + Patterning, including the following topics:
- Plasma eatching processes for non-volatile memories
- Sustainabilitiy in microelectronics industry
- Evaluation of alternative chemistries for lithography (non-fluorinated)
- Etching mechanisms behing greyscale
- Metrology and characterization processes
CEA-Leti scientific papers
Thierry Chevolleau will have the honor of chairing Session 9: Computational Patterning, Patterning Process Control and Plasma Process Modeling and Simulation
27 February 2025
10:40 AM - 11:40 AM
Convention Center,
Room 211B
Session Chairs:Keun Hee Bai, SAMSUNG Electronics Co., Ltd. (Korea, Republic of), Thierry Chevolleau, CEA-LETI (France)