You are here : Home > Leti @SPIE Advanced Lithography 2019

Event


Leti @SPIE Advanced Lithography 2019

From 2/26/2019 to 2/28/2019
Convention Center San Jose, California, United States




This year, Leti researchers will present 7 papers at SPIE Advanced Lithography 2019, the world's premiere lithography event where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Leti will also host a satellite Lithography Workshop in partnership with ARKEMA, and E-BEAM on Thursday, Feb. 28th, 2019, Marriott Hotel, San José, CA.

FREE event by invitation only. For more info, contact Laurent.pain@cea.fr

 

Here are Leti's presentations at SPIE Advanced Lithography 2019:

Tuesday 26th Feb, 2019    

  • Session 3 - Grayscale lithography process study for sub 5µm microlens patterns
    Time: 11:50 am
  • Session 7 - Application of PSD for the extraction of programmed line roughness from SAXS
    Time: 3:40 pm
  • Session 7  - Tilted beam SEM, 3D metrology for industry

       Time: 5 pm

 

Wednesday 27th Feb, 2019   

  • Session 6 - Performance validation of Mapper's FLX-1200
    Time: 9 am
  • Session 8 - Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
    Time: 11:10 am
  • Session 4 - 3D Resist Reflow Compact Model for Imager Microlens Shape Optimization
    Time: 4:10 pm

 

Thursday 28th Feb, 2019 

  • Session 12 -   Sub 10nm patterning using DNA origami

       Time: 1:30 pm


Practical information

San Jose Convention Center
San Jose, California, United States

Top page

Events

RSS feed

  • 27 Nov
    8h-18h      Workshop Microneedles for Biosensing

    Event | Agenda |  Grenoble, France

    Wearable analytical devices capable of minimally invasive and real-time detection of biomarkers are revolutionizing the autonomous and continuous monitoring of bodily indicators. Interstitial fluid (ISF), the most abundant liquid in the human body, constitutes a very rich source of biomarkers. With a volume three times larger than blood, it shares with it a strong correlation in terms of composition. Microneedles (MNs), microstructures typically ranging from 400 to 1200 µm in height for humans, possess the ability to minimally invasively penetrate the skin and reach dermal ISF for its collection and/or in situ analysis. This workshop will discuss the development and applications of microneedle-based wearable devices for biosensing, giving full visibility to speakers from academia and industrial R&D teams, highlighting new ideas, research results, and development experiences. At the end of the workshop, a panel discussion for all the attendees will be organized, providing networking opportunities.

  • 8 Dec au 11 Dec CEA-Leti at IEDM 2024 - San Francisco

    Event |  Hilton, San Francisco Union Square

    CEA-Leti to Present Research Breakthroughs in Non-Volatile Memory, RF and FD-SOI, and Other Highlights at December IEDM Gathering​ CEA-Leti will highlight its most recent research advances in several fields at the 2024 International Electron Devices Meeting (IEDM), Dec. 7-11, at the Hilton San Francisco Union Square.​

  • 8 Dec
    17h30-21h      Leti Devices Workshop 2024

    Event |  San Francisco

    Efficiency and sustainability are now primary concerns for the production of devices that rely on semiconductors. As a result, research must be organized to find smarter approaches for material integration, device efficiency and long-term sustainability. During the Leti Devices Workshop, CEA-Leti experts will share their visions, innovations and achievements in the field of More than Moore applications. ​​​​Notably, the event will highlight key results in terms of efficient computing and radiofrequency devices.

  • 17 Jun
    2025
    19 Jun
    2025         CEA-Leti Innovation Days 2025

    Event |  Maison Minatec, Grenoble, France

    CEA-Leti Innovation Days is back for a new edition! CEA-Leti Innovation Days 2025 from 17 to 19 june will offer you a front-row seat to our most recent advances. Join more than 1,100 semiconductor industry professionals at this three-day global event and come away equipped and inspired to innovate!

See more