This year, Leti researchers will present 7 papers at SPIE Advanced Lithography 2019, the world's premiere lithography event where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.
Leti will also host a satellite Lithography Workshop in partnership with ARKEMA, and E-BEAM on Thursday, Feb. 28th, 2019, Marriott Hotel, San José, CA.
FREE event by invitation only. For more info, contact Laurent.pain@cea.fr
Here are Leti's presentations at SPIE Advanced Lithography 2019:
Tuesday 26th Feb, 2019
- Session 3 - Grayscale lithography process study for sub 5µm microlens patterns
Time: 11:50 am - Session 7 - Application of PSD for the extraction of programmed line roughness from SAXS
Time: 3:40 pm - Session 7 - Tilted beam SEM, 3D metrology for industry
Time: 5 pm
Wednesday 27th Feb, 2019
- Session 6 - Performance validation of Mapper's FLX-1200
Time: 9 am - Session 8 - Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
Time: 11:10 am - Session 4 - 3D Resist Reflow Compact Model for Imager Microlens Shape Optimization
Time: 4:10 pm
Thursday 28th Feb, 2019
- Session 12 - Sub 10nm patterning using DNA origami
Time: 1:30 pm