You are here : Home > Leti Alternative Lithography Workshop

Leti Alternative Lithography Workshop

From 3/1/2018 to 3/1/2018
Marriot Hotel, San Jose, California


Thank you for attending Leti's Alternative Lithography Workshop

To download our presentations, please click below.


​Introduction  - Leti Ecosystem  by Laurent PAIN, Leti

​Accelerated innovation through strategic collaboration: a view from an equipment supplier by Olivier VATEL, SCREEN

​MAPPER: High throughput Maskless Lithography by  Marco WIELAND, MAPPER 

​Dynamic Blanker Integration Into The MAPPER Tool: The Dynamics Of An Announced Success, by  S.LANDIS, Leti 

​Directed Self Assembly Of Block Copolymers: From Materials To Integration by   R.TIRON  & C.NAVARRO, Leti 

​EVG SmartNIL® Technology for Patterning Requirements of More than Moore Applications by Dr. Martin EIBEHUBER, EVG

​The Leti Nil Assessment Platform by H.TEYSSEDRE, Leti 

​The Leti Lithopole By Laurent PAIN, Leti 

 The Future isn't what is used to be by Yan  BORODOVSKY

In partnership with ARKEMA, EVG, and MAPPER, Leti will present its advanced lithography programs, including an assessment of three alternative patterning technologies currently implemented in a Leti pilot line environment: DSA, Full wafer scale imprint and Massively parallel Direct write. Presentations will be both technical and business oriented.

This event is generously sponsored by SCREEN and Ebeam initiative.  

Read more and register

Practical information

​Marriot Hotel, San Jose, California

Contact: Laurent.pain@cea.fr

Top page

Events

RSS feed

  • 27 Nov
    8h-18h      Workshop Microneedles for Biosensing

    Event | Agenda |  Grenoble, France

    Wearable analytical devices capable of minimally invasive and real-time detection of biomarkers are revolutionizing the autonomous and continuous monitoring of bodily indicators. Interstitial fluid (ISF), the most abundant liquid in the human body, constitutes a very rich source of biomarkers. With a volume three times larger than blood, it shares with it a strong correlation in terms of composition. Microneedles (MNs), microstructures typically ranging from 400 to 1200 µm in height for humans, possess the ability to minimally invasively penetrate the skin and reach dermal ISF for its collection and/or in situ analysis. This workshop will discuss the development and applications of microneedle-based wearable devices for biosensing, giving full visibility to speakers from academia and industrial R&D teams, highlighting new ideas, research results, and development experiences. At the end of the workshop, a panel discussion for all the attendees will be organized, providing networking opportunities.

  • 8 Dec au 11 Dec CEA-Leti at IEDM 2024 - San Francisco

    Event |  Hilton, San Francisco Union Square

    CEA-Leti to Present Research Breakthroughs in Non-Volatile Memory, RF and FD-SOI, and Other Highlights at December IEDM Gathering​ CEA-Leti will highlight its most recent research advances in several fields at the 2024 International Electron Devices Meeting (IEDM), Dec. 7-11, at the Hilton San Francisco Union Square.​

  • 8 Dec
    17h30-21h      Leti Devices Workshop 2024

    Event |  San Francisco

    Efficiency and sustainability are now primary concerns for the production of devices that rely on semiconductors. As a result, research must be organized to find smarter approaches for material integration, device efficiency and long-term sustainability. During the Leti Devices Workshop, CEA-Leti experts will share their visions, innovations and achievements in the field of More than Moore applications. ​​​​Notably, the event will highlight key results in terms of efficient computing and radiofrequency devices.

  • 17 Jun
    2025
    19 Jun
    2025         CEA-Leti Innovation Days 2025

    Event |  Maison Minatec, Grenoble, France

    CEA-Leti Innovation Days is back for a new edition! CEA-Leti Innovation Days 2025 from 17 to 19 june will offer you a front-row seat to our most recent advances. Join more than 1,100 semiconductor industry professionals at this three-day global event and come away equipped and inspired to innovate!

See more