Thank you for attending Leti's Alternative Lithography Workshop
To download our presentations, please click below.
In partnership with ARKEMA, EVG, and MAPPER, Leti will present its advanced lithography programs, including an assessment of three alternative patterning technologies currently implemented in a Leti pilot line environment:
DSA, Full wafer scale imprint and Massively parallel Direct write. Presentations will be both technical and business oriented.
This event is generously sponsored by SCREEN and
Ebeam initiative.
Read more and register