Univ Grenoble Alpes, Grenoble, France, CEA, LETI, MINATEC Campus, Grenoble, France, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki, Japan, SPEC, CEA, CNRS, Université Paris-Saclay, CEA SaclayGif-sur-Yvette, France

We investigated origins of the resistivity change during the forming of ZrTe/Al2O3 based conductive-bridge resistive random access memories. Non-destructive hard X-ray photoelectron spectroscopy was used to investigate redox processes with sufficient depth sensitivity. Results highlighted the reduction of alumina correlated to the oxidation of zirconium at the interface between the solid electrolyte and the active electrode. In addition the resistance switching caused a decrease of Zr-Te bonds and an increase of elemental Te showing an enrichment of tellurium at the ZrTe/Al2O3 interface. XPS depth profiling using argon clusters ion beam confirmed the oxygen diffusion towards the top electrode. A four-layer capacitor model showed an increase of both the ZrO2 and AlOx interfacial layers, confirming the redox process located at the ZrTe/Al2O3 interface. Oxygen vacancies created in the alumina help the filament formation by acting as preferential conductive paths. This study provides a first direct evidence of the physico-chemical phenomena involved in resistive switching of such devices. © 2017 Elsevier B.V.

CBRAM, HAXPES, Interface chemistry, Oxygen scavenging, RRAM

Alumina, Depth profiling, Electrodes, Electrolytes, Ion beams, Oxygen, Oxygen vacancies, Random access storage, RRAM, Scavenging, Solid electrolytes, Tellurium compounds, Zirconium, CBRAM, Conductive-bridge memory, Hard X-ray photoelectron spectroscopy, Hax-pes, Interface chemistry, Oxygen scavenging, Resistance switching, Resistive random access memory, X ray photoelectron spectroscopy