University Grenoble Alpes, CEA, LETI, MINATEC, 17 rue des martyrs, Grenoble, France, Optics and Signal Processing Consultant, 29 bis rue de l’Abbé Vincent, Fontaine, France

New architectures of interference silver-dielectric multilayer filters inspired from induced transmission designs are investigated with the prospect of high-performance red-green-blue (RGB) complementary metal oxide semiconductor imaging. The optimized designs provide combined colorimetric, signal-to-noise ratio and sensitivity performances similar to the traditional organic color filters, but without the equirement of an external infrared (IR)-cut filter, which enables the integration of additional channels such as white or IR, in addition to RGB. Due to the sub-micrometer thickness of the stacks, this is a unique solution for fully integrated, high-performance multispectral filters patterned in very small pixels. The concept is demonstrated by a wafer-scale prototype with RGBIR filters patterned down to 1.4 ?m adjacent pixels with up to 80% transmission. © 2018 Optical Society of America.

Bandpass filters, CMOS integrated circuits, Metals, MOS devices, Oxide semiconductors, Pixels, Silver, Thickness measurement, Adjacent pixels, Complementary metal oxide semiconductors, Dielectric interference filters, Dielectric multilayers, Fully integrated, Induced transmission, Optimized designs, Sensitivity performance, Signal to noise ratio