CEA-LETI/Minatec, 17 rue des Martyrs, Cedex 9, Grenoble, France, Evatec AG, Haupstrasse 1a, Trübbach, Switzerland

Thin films based on layers of Fe52Co28B20 (at%), Fe65Co35 (at%), and Ni80Fe20 (at%) were deposited by sputtering on 8? bare Si and Si/200 nm-thermal-SiO2 wafers by simultaneous use of two or more cathodes. Due to the continuous rotation of the substrate cage, such that the substrates faced different targets alternately, the multilayers consisted of stacks of alternating, nanometer-thick regular layers. The composition of the films was determined by Rutherford Backscattering Spectrometry (RBS) and Nuclear Reactive Analysis (NRA), whereas Plasma Profiling Time of Flight Mass Spectrometry (PP-TOFMS) analysis gave depth profile information about the chemical elements. The structural and magnetic properties of the films were investigated by X-ray Diffraction and by TEM analysis, B-H loop tracer and high frequency single coil technique permeametry, respectively. The linear dependence of the coercivity of these thin films versus the grain size can be explained by the random anisotropy model. These novel, composite soft magnetic multilayers, with tunable in-plane anisotropy, allow operation at tunable frequencies, as shown by broadband (between 100 MHz and 10 GHz) RF measurements that exhibit a classical Landau-Lifschitz-Gilbert (LLG) behavior and, combine the magnetic properties of the individual materials in an advantageous way. This article presents a method to produce nanostructured soft magnetic multilayers, the properties of which can easily be tuned by choosing the ratio of the individual nanolayers. In this way it's possible to combine soft magnetic materials with complementary properties, e.g. high saturation magnetization, low coercivity, high specific resistivity and low magnetostriction © 2018 Elsevier B.V.

Anisotropy, Binary alloys, Chemical analysis, Chemical elements, Cobalt alloys, Cobalt compounds, Coercive force, Depth profiling, Film preparation, Iron alloys, Iron compounds, Magnetic materials, Magnetic properties, Magnetic thin films, Magnetism, Mass spectrometry, Multilayers, Nickel alloys, Rutherford backscattering spectroscopy, Saturation magnetization, Silica, Silicon wafers, Soft magnetic materials, Spectrometry, Substrates, Thin films, X ray diffraction, High-saturation magnetization, Random anisotropy models, Rutherford backscattering spectrometry, Soft magnetic multilayers, Soft magnetic thin films, Specific resistivities, Structural and magnetic properties, Time of flight mass spectrometry, Magnetic multilayers