SCREEN Semiconductor Solutions Co.,Ltd., 480-1 Takamiya-cho, Hikone, Shiga, Japan, SCREEN SPE Germany GmbH, Fraunhoferstrasse 7, Ismaning, Germany, CEA-LETI MINATEC, 17 Rue des Martyrs, Grenoble, Cedex 9, France, ARKEMA France, 420 rue d'Estienne d'Orves, Colombes, France

PS-b-PMMA block copolymer is a well-known DSA material, and there are many DSA patterning methods that make effective the use of such 1st generation materials. Consequently, this variety of patterning methods opens a wide array of possibilities for DSA application[1-4]. Last year, during the inaugural International DSA Symposium, researchers and lithographers concurred on common key issues for DSA patterning methods such as: defect density, LWR, placement error, etc. Defect density was specifically expressed as the biggest obstacle for new processes. Coat-Develop track systems contribute to the DSA pattern fabrication and also influence the DSA pattern performances[4]. In this study, defectivity was investigated using an atmosphere-controlled chamber on the SOKUDO DUO track. As an initial step for expanding the DSA process window, fingerprint patterns were used for various atmospheric conditions during DSA self-Assembly annealing. In this study, we will demonstrate an improved DSA process window, and then we will discuss the mechanism for this atmospheric effect. © 2017 SPIE.

Atmosphere control, Coat develop track, Defectivity, Directed self-Assembly (DSA), Fingerprint, Graphoepitaxy

Block copolymers, Defects, Self assembly, Atmosphere controls, Coat develop track, Defectivity, Directed self-assembly, Fingerprint, Graphoepitaxy, Defect density