You are here : Home > Chemical stability of Si-SiC nanostructures under physiological conditions

Publications

Chemical stability of Si-SiC nanostructures under physiological conditions

Published on 29 March 2018
Chemical stability of Si-SiC nanostructures under physiological conditions
Description
 
Date 
Authors
Bange R., Bano E., Rapenne L., Labau S., Pelissier B., Legallais M., Salem B., Stambouli V.
Year2017-0044
Source-TitleMaterials Science Forum
Affiliations
IMEP-LaHC, 3 parvis Louis Néel, Grenoble Cedex 1, France, LMGP, 3 parvis Louis Néel, Grenoble Cedex 1, France, LTM, CEA-Leti, 17 avenue des Martyrs, Grenoble cedex 9, France
Abstract
The fast and direct detection of small quantities of biological and chemical species is of key importance for numerous biomedical applications. Extensive research has been conducted on nanoelectronic devices that can perform such detection with high sensitivity using silicon nanowires and nanostructures. However, it was recently demonstrated that Si material suffers a lack of longterm stability in physiological environments at nanometer scale [1,2], and is hence not suited for in situ sensing of biological molecules. The results presented here are two important steps toward the realization of core-shell Si-SiC NWFETs for the detection of biomolecules in liquid media. First, we show that SiC NWs exhibit higher chemical stability than Si NWs under physiological conditions. Second, we present the successful carburization of a thin film of Si resulting in a 3.6 nm thin SiC layer. © 2017 Trans Tech Publications, Switzerland.
Author-Keywords
Chemical stability, DNA, Nanowire, NWFET, Sensor, Silicon, Silicon Carbide
Index-Keywords
Biological materials, Biomolecules, Chemical detection, DNA, Medical applications, Molecular biology, Nanostructures, Nanowires, Physiology, Sensors, Silicon, Silicon carbide, Stability, Biological molecule, Biomedical applications, Detection of biomolecules, Long term stability, Nanoelectronic devices, NWFET, Physiological condition, Physiological environment, Chemical stability
ISSN2555476
LinkLink

Retour à la liste