Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications
| Description | |
| Date | |
| Authors | Claveau G., Argoud M., Pimenta-Barros P., Chamiot-Maitral G., Tiron R., Chevalier X., Navarro C. |
| Year | 2017-0076 |
| Source-Title | Proceedings of SPIE - The International Society for Optical Engineering |
| Affiliations | CEA-LETI, MINATEC Campus, 17 Rue des Martyrs, Grenoble, France, ARKEMA France, Route Nationale 117, Lacq, France |
| Abstract | Directed Self Assembly (DSA) of block-copolymers (BCPs) used as a complementary technique to the 193nm immersion lithography has demonstrated sub-10nm node applications in both via and line/space patterning. We propose however to study the performance of graphoepitaxy which allows DSA with thicker initial BCP layer, higher multiplication factors and stronger orientation control of lamellae. The aim of this work is to use the 300mm pilot line available at LETI and Arkema's advanced materials to evaluate the performances of a novel graphoepitaxy process based on the work on a 38nm period lamellar PS-b-PMMA (L38) reported before. © 2017 SPIE. |
| Author-Keywords | |
| Index-Keywords | Block copolymers, 193nm immersion lithography, Advanced materials, Complementary techniques, Directed self-assembly, Line/space patterning, Multiplication factor, Orientation control, Process-based, Self assembly |
| ISSN | 0277786X |
| Link | Link |