SiOCH thin films deposited by chemical vapor deposition: From low-? to chemical and biochemical sensors
| Description | |
| Date | |
| Authors | Jousseaume V., El Sabahy J., Yeromonahos C., Castellan G., Bouamrani A., Ricoul F. |
| Year | 2017-0105 |
| Source-Title | Microelectronic Engineering |
| Affiliations | Univ. Grenoble Alpes, Grenoble, France, CEA, LETI, MINATEC Campus, Grenoble, France, CEA, LETI-Clinatec, MINATEC Campus, Grenoble, France |
| Abstract | Significant advances have been made in the realization of porous SiOCH by chemical vapor deposition processes. In this paper, the different approaches developed to introduce porosity in an organosilicate thin films are described with a specific focus on the new concepts to obtain highly porous SiOCH by CVD and to simplify the existing processes. A second part of the paper is dedicated to the application of these porous SiOCH thin films in nanotechnologies: from low-? dielectrics to chemical and biochemical sensors. © 2016 Elsevier B.V. |
| Author-Keywords | Organosilicate glass, PECVD, Porosity, UV curing |
| Index-Keywords | Chemical vapor deposition, Curing, Deposition, Plasma enhanced chemical vapor deposition, Porosity, Thin films, Bio-chemical sensor, Chemical vapor deposition process, Organosilicate glass, Organosilicate thin films, UV-curing, Vapor deposition |
| ISSN | 1679317 |
| Link | Link |